Aerosol Depostion System

▪ Depostion Temperature : ambient
▪ Chamber Pressure : 5 x 10-3 Torr
▪ Substrate Size : Max. 300 x 300mm
▪ Deposition Rate : 1 um/h
▪ Uniformity : +/-3%
▪ Supply Gas : H2, O2, Ar, N2
▪ Power : 220/380 VAC 3P, 10kW
▪ Motor-controlled sample stage
▪ PLC Based PC control System
▪ Optional Non-agrgregation Feeding Unit
▪ System Compostions : reactor chamber, pumping unit, movig stage, mulit-nozzle unit, gas flow control, control unit