Pulsed Laser Deposition System

▪ substrate Size : 2 inch or Multiple small substrates
▪ Substrate Temperature : Mold Heater 800℃ & IR lamp heater 1000℃
▪ Temperature Uniformity : Mold ±3% & IR lamp ±3% on 2 inch deameter
▪ Operating Pressure Range : 1 x 10-6 Torr base to 500m Torr
▪ Target size : four channel 2 inch diameter target
▪ Target to Substrate (Throw) Distance : 75mm, adjustable
▪ Nominal Angle of Incidence of the Laser Beam on Target : 60∘
▪ Base Pressure of the Main Chamber : 1 x 10-6 Torr guaranteed
▪ Semi Automation Operating (Safety Interlock)
▪ Option : Load lock system